Launch of the NEW CXC-20 ALD/CVD Deposition Cluster – A Milestone for COAT-X

I’m thrilled to share a major milestone for COAT-X: the launch of our CXC-20 ALD/CVD Deposition Cluster! This new system represents a significant leap forward in our mission to deliver cutting-edge protective coatings for the most demanding applications.

Innovation in Barrier Coatings

At COAT-X, we’ve always pushed the boundaries of what’s possible in protective coatings. Our latest breakthrough combines Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) to create best-in-class multilayer coatings. These coatings, featuring both parylene and ceramic layers, offer unmatched barrier performance—especially for highly sensitive products like Active Implantable Medical Devices (AIMD). The result? Ultra-high barrier solutions with exceptionally low water vapor transmission rates, ensuring long-term protection against corrosion and degradation.

Introducing the CXC-20

The CXC-20 is our newest integrated ALD/CVD deposition cluster, designed to make this advanced technology accessible to a broader audience. With a fully automated handling system and a modular, scalable design, the CXC-20 enables the production of complex multilayer structures without manual intervention. It’s a game-changer for industries requiring the highest standards of protection.

Why It Matters

  • Automation & Scalability: The CXC-20 coordinates both ALD and CVD reactors, each with a 20-liter capacity, allowing for seamless production of advanced coatings.
  • Proven Performance: Our CX ULTIMA coatings, produced using this technology, have already demonstrated implant lifetimes exceeding 10 years—a testament to the power of innovation.
  • Versatility: The system’s modular design means we can easily expand capacity or add larger reactors as demand grows.

For more details, visit the official announcement on the COAT-X website

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